Semiconductor UHP Gas Analysis & Monitoring Systems
Ultra-high-purity (UHP) gas analysis is the continuous measurement of trace contaminants, chiefly oxygen and moisture, in the bulk gases that feed a semiconductor fab. Nitrogen, argon, hydrogen, helium and CO2 all reach the tool, and at modern geometries a few parts per billion of O2 or H2O can cost yield. ASTG builds the fixed analyzers and turnkey systems that verify those gases before they reach the tool, measuring trace oxygen and moisture down to the parts-per-billion level with cavity ring-down spectroscopy (CRDS).
What needs monitoring, and why
In a fab, a bulk gas is only as good as its worst contaminant. Oxygen and moisture are the two that matter most in nitrogen, argon, hydrogen and helium; in oxygen and CO2 streams, moisture is the measure that counts. ASTG monitors each continuously, so a drift is caught before it reaches a process tool rather than after a batch is lost.
| Bulk gas | What ASTG monitors |
|---|---|
| Nitrogen, argon, hydrogen, helium | Trace oxygen and moisture, to the parts-per-billion level |
| Oxygen | Trace moisture |
| Carbon dioxide | Trace moisture |
How ASTG verifies UHP gas
The core platform is the Gas Purity Monitoring System (GPMS), a fixed analytical system that measures trace oxygen and moisture in high-purity hydrogen, nitrogen, helium and argon, plus moisture in oxygen and CO2. It uses a series of cavity ring-down spectrometers, each tied to an on-board PLC that communicates with your facility monitoring system (FMS). GPMS is offered in four configurations, depending on the gas combination you need to test. Where the work is mobile, ASTG's analytical carts measure trace O2 and H2O continuously, to the parts-per-billion level, in UHP gases. View the GPMS.
ASTG's semiconductor systems
UHP monitoring carts
Mobile, self-contained systems for continuous trace O2 and H2O monitoring to the parts-per-billion level in UHP gases. Roll one to the sample point for spot checks or campaign monitoring. View the analytical carts.
Ion Mobility Spectrometer (IMS)
The IMS watches the air in the fab rather than the gas in the line, detecting trace acid and base contaminants such as HCl, HF and NH3 in real time. These airborne molecular contaminants attack wafers, optics and tool surfaces at parts-per-billion levels, so continuous detection flags an excursion before it reaches the process. View the Ion Mobility Spectrometer.
UHP gas blenders
Precision gas blending for UHP applications, including the ASTG-RBS Remote Blending System, which pairs computer-controlled mass-flow blending with remote I/O blend modules for accurate, repeatable gas mixtures. View the gas blenders.
Cryogenic purification systems
Cryogenic purifiers cool gas close to its boiling point to condense and remove trace impurities, delivering high-purity output for demanding fab applications. View the cryogenic purifiers.
Also in the semiconductor line
Continuous Quality Control (CQC) monitoring, Air Separation Unit (ASU) purity monitoring, orbitally welded gas sample distribution manifolds, stream-switching systems, low-pressure sampling kits, field regulator boxes and fixed gas detection.
Turnkey systems, built to UHP standards
ASTG designs complete systems, not just instruments. Sampling, switching and distribution are built from orbitally welded components using ultra-high-purity engineering techniques, so the reading reflects the gas actually in the line, without cross-contamination or leakage. Systems integrate with your FMS for data, alarms and remote operation.
Resources
Application note: measuring trace oxygen and moisture in bulk N2, Ar, H2, He and CO2. GPMS data sheet. Mobile systems flyer.
Semiconductor UHP gas analysis FAQ
What is UHP gas analysis in semiconductor manufacturing?
It is the continuous measurement of trace contaminants, mainly oxygen and moisture, in the bulk gases used in a fab: nitrogen, argon, hydrogen, helium and CO2. The gas is verified before it reaches the process tool, because contamination at the parts-per-billion level can affect device yield.
Which gases and contaminants does a fab need to monitor?
Across nitrogen, argon, hydrogen and helium, the priorities are trace oxygen and moisture. In oxygen and CO2 streams, moisture is the key measure. ASTG monitors all of these continuously.
How does ASTG detect trace oxygen and moisture?
ASTG's GPMS uses a series of cavity ring-down spectrometers (CRDS) to measure trace oxygen and moisture down to the parts-per-billion level in high-purity bulk gases.
How does the GPMS integrate with a fab?
Each spectrometer is tied to an on-board PLC that communicates with your facility monitoring system (FMS). GPMS comes in four configurations, depending on the gas combination you need to test.
Does ASTG provide complete turnkey systems?
Yes. ASTG builds sampling, switching and distribution from orbitally welded components using ultra-high-purity engineering techniques, and integrates the analyzers with your FMS for data, alarms and remote operation.
Get started
Request a UHP monitoring review · Download the GPMS data sheet · Browse semiconductor products
Related: Cryogenic purifiers · Industrial gas systems · Analysis by contaminant · Analysis by bulk gas
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